Ti-B-N薄膜沉积过程中离子轰击的效应  

THE EFFECT OF ION BOMBARDMENT IN THE DEPOSITION OF TI-B-N FILMS

作　　者：赵南方 杨巧勤[1,2] 赵立华[1,2] 肖汉宁[1,2] 成奋强 

机构地区：[1]湖南大学材料测试研究中心 [2]中南工业大学粉末冶金研究所

出　　处：《中国陶瓷》1998年第2期26-29,共4页China Ceramics

基　　金：湖南省自然科学基金

摘　　要：使用活化离子镀和Ｎ离子轰击Ｔｉ－Ｂ薄膜制备了Ｔｉ－Ｂ－Ｎ薄膜，研究了Ｔｉ－Ｂ－Ｎ薄膜沉积过程离子轰击的效应。结果表明离子轰击具有增强界面扩散、激发化学反应的作用。特别是离子轰击可使小区域内产生高温高压，使局部区域成为立方ＢＮ的稳态生长区，而获得亚稳相立方ＢＮ。i-B-N films prepared by EB-ion plating and N ion bombardment on a Ti-B film.The Effect of Ion Bombardment in the deposition of Ti-B-N Films were studied,The negative bias voltage to the substrate and the N ion bombardment have the effects of ehancing interfacial diffusion and stimulating the chemical reaction for the formation of the metastable phase.Especially,the bombardment of ion with high energy in the process of ion plating can produce high temperature and high pressure in local region,in which cubic BN is stable.This is why cubic BN can be obtained.

关 键 词：薄膜 离子轰击 沉积 离子镀 镀膜 陶瓷 

分 类 号：TQ174.758[化学工程—陶瓷工业]