Ce_(0.8)Zr_(0.2)O_2固溶体磨料对ZF7光学玻璃抛光性能的改善  

Improvement on Polishing Performance of Ce_(0.8)Zr_(0.2)O_2 Solid Solution Abrasives for ZF7 Optical Glass

作　　者：傅毛生[1,2] 李永绣[1] 陈伟凡[3] 危亮华[1] 胡建东[1] 

机构地区：[1]南昌大学稀土与微纳功能材料研究中心,江西南昌330047 [2]南昌航空大学环境与化学工程学院,江西南昌330063 [3]南昌大学材料科学与工程学院,江西南昌330047

出　　处：《摩擦学学报》2009年第2期180-185,共6页Tribology

基　　金：国家自然科学基金资助项目(201610002);江西省主要学科学术带头人计划;江西省自然科学基金资助项目

摘　　要：采用改进的湿固相机械化学反应法制备出超细锆掺杂氧化铈磨料Ce1-xZrxO2(x=0,0.2),运用X射线衍射(XRD)、透射电镜(TEM)等手段表征其物相类型、外观形貌、比表面积、粒度、表面电位等物理性质,通过测定抛光速率和观察表面的微观形貌考察它们对ZF7光学玻璃的抛光性能影响.结果表明,Ce0.8Zr0.2O2固溶体磨料对ZF7光学玻璃抛光性能比纯CeO2磨料有明显的提高,抛光速率达到463 nm/min,5.0μm×5.0μm的范围内微观表面粗糙度Ra值达到1.054 nm,而纯CeO2磨料的抛光速率只有292 nm/min,Ra值却增大到1.441 nm.Ce0.8Zr0.2O2固溶体的抛光速率的明显增大和表面粗糙度Ra的下降主要与其负表面电位的增大和颗粒尺寸、粒度的减小密切相关.Ultrafine abrasives Ce1-xZrxO2 （x = 0, 0.2） were prepared via a modified wet - solid mechanochemical method, and their crystalline phase type, morphology, specific surface area, particle size and surface zeta potential were characterized by XRD, TEM and so on. The chemical - mechanical polishing （CMP） performance of as - synthesized abrasives for ZF7 optical glass was evaluated by the material removal rate （MRR） determination and AFM observation. Polishing performance of Ce0.8Zr0.2O2 solid solution abrasives for ZF7 optical glass greatly improved than that of pure CeO2 abrasives. The MRR of Ce0.8Zr0.2O2 solid solution abrasives slurry reached 463 nm/min, and its average roughness （Ra） of polished glass surface was 1. 054 nm within 5.0 μm × 5.0 μm district. In contrast, the MRR and Ra value of pure CeO2 were decreased to 292 nm/min and increased to 1. 441nm, respectively. The increase in the MRR value and the decrease in Ra value of Ce0.8Zr0.2O2 solid solution abrasives was nearly related to the increase of its minus particle surface Zeta potential and the decrease of its particle size.

关 键 词：湿固相机械化学反应法 Ce0.8Zr0.2O2固溶体 化学机械抛光 ZF7光学玻璃 

分 类 号：O614.33[理学—无机化学] O614.41[理学—化学]