基于酸解型聚甲基丙烯酸酯的化学增幅成像材料及应用  

Chemically Amplified Photographic Materials Based on Acidolytic Polymethacrylate and their Applications

作　　者：黎莹[1] 程龙[1] 王力元[1] 

机构地区：[1]北京师范大学化学学院,北京100875

出　　处：《影像技术》2009年第2期21-24,共4页Image Technology

基　　金：北京市自然科学基金(2082014)资助项目

摘　　要：甲基丙烯酸分别与乙烯基乙基醚和二氢吡喃反应得到羧基被保护的酯化物。这些甲基丙烯酸酯单体进行均聚并分别与甲基丙烯酸甲酯、甲基丙烯酸-2-羟乙酯进行二元共聚。这些聚合物的保护基具有在室温下的高酸解活性,可以和产酸剂(三嗪化合物)、酚醛树脂一起组成化学增幅型感光成像材料,可用作i-线光致抗蚀剂和高感度PS版感光剂,其感度在100mj/cm2以下。此感光体系中加入红外染料即可用作热敏CTP版材成像材料。都获得了很好的成像表现。Methacrylic acid was reacted with vinyl ethyl ether and dihydropyran to give carboxylic acid group protected ester compounds. Homopolymers and copolymers were obtained by the polymerization reaction of these compounds and the reaction of them with two other methacrylate monomers. Chemically amplified photographic materials can be formed by the polymers, the protected groups of which have high acidolytic activity at room temperature, photoacid generator （triazine） and phenolic resin. They can be used as i-line photoresist and photosensitive material for PS plates with photosensitivity less than 100mj/cm^2. Lithographic material for thermal sensitive CTP plate can be obtained by the addition of IR dye to the photosensitive material. Good lithographic performance was obtained for these materials.

关 键 词：甲基丙烯酸酯 酸解 产酸剂 化学增幅光致抗蚀剂 PS版 热敏CTP版 

分 类 号：O644.1[理学—物理化学] TQ577[理学—化学]