谐振腔式微波等离子体金刚石膜沉积室的研究  

Research of Resonant Cavity of Microwave Plasma Reactor for Diamond Film Growth

作　　者：张挺[1] 唐璞[1] 陈波[1] 

机构地区：[1]电子科技大学电子工程学院,成都611731

出　　处：《微波学报》2010年第S1期71-74,共4页Journal of Microwaves

摘　　要：微波等离子体化学气相沉积(MPCVD)技术被认为是制备高质量金刚石膜的一种最重要的技术手段。但是金刚石膜制备技术的失衡造成了目前国内高品质金刚石膜制备技术水平处于停滞状态,致使国内对高品质金刚石膜的迫切需要一直得不到满足。为此,文章主要通过HFSS软件对椭圆谐振腔式的微波等离子体的CVD装置进行设计及对主要尺寸进行优化,并通过相同条件下与圆柱谐振腔式的CVD装置的对比,得出了椭圆谐振腔式微波等离子体CVD装置优于圆柱谐振腔式CVD装置这个结论。microwave plasma chemical vapor deposition(MPCVD)system ususlly is deemed to make high guality diamond fims and wafers by people,which is important technique.But,at present,because lacking of this technique,we don't content with this phenomena about the need of high guality diamond fims and wafers.In this article,the primary task is to design elliposoidal microwave plasma reactors which made of stainless steel and to optimize leading dimension.For in contrast with the cylindrical microwave plasma reactor,the same condition consist of the same input fruquency and same input power is choosed,by comparising with cylindrical microwave plasma reactor,it is conclusion that the structure of elliposoidal resonant cavity is better than the cylindrical structure.It have more advantages.

关 键 词：等离子体 金刚石膜 谐振腔 优化 

分 类 号：TN304.055[电子电信—物理电子学]