用于超分辨近场结构光盘存储的掩膜材料  

Progress in Mask Materials Used for Super-RENS Optical Storage

作　　者：孙华军[1] 侯立松[1] 

机构地区：[1]中国科学院上海光学精密机械研究所,上海201800

出　　处：《材料科学与工程学报》2009年第2期288-291,270,共5页Journal of Materials Science and Engineering

基　　金：国家重点基础研究发展计划资助项目(2007CB935402);国家自然科学基金资助项目(50502036;60644002)

摘　　要：超分辨近场结构(Super-RENS)光盘存储技术是近年研究的热点,而用作超分辨近场结构的掩膜材料是决定其性能的关键。本文总结了用于近场超分辨结构光盘存储的掩膜材料的最新研究成果,阐述了材料的工作原理和性能特点,展望了其发展趋势。Super-RENS is one of the hotspots in the field of optical storage, the materials used for Super-RENS optical storage as a mask layer play a most important role in the storage system. In this article, latest experimental and theoretical results on the R ＆ D of the materials are reviewed ; the working principle and characteristics of different kinds of the materials used for Super-RENS are introduced; and the development trends of these materials are prospected.

关 键 词：掩膜材料 光存储 SUPER-RENS 评述 

分 类 号：O484[理学—固体物理]