金刚石薄膜显微结构研究  

STUDY OF THE MICROSTRUCTURE OF DIAMOND FILM

作　　者：赵南方[1] 杨巧勤[2] 赵立华[2] 肖汉宁 

机构地区：[1]中南工业大学粉末冶金研究所,长沙410083 [2]湖南大学材料测试研究中心,长沙410082

出　　处：《炭素》1998年第1期40-43,共4页Carbon

基　　金：湖南省自然科学基金

摘　　要：采用多种现代分析方法研究了热丝CVD法高速生长的金刚石薄膜的显微结构。XRD和Raman光谱结果表明薄膜由金刚石组成，金刚石薄膜的晶格参数与天然金刚石一致，没有非金刚石碳与其它杂相存在。AES与SIMS结果表明金刚石膜中只含有极微量的O、Na、N等杂质。SIMS分析结果还表明同位素C13在金刚石膜生长过程中富集。SEM结果表明基片表面状况影响金刚石薄膜的形核密度，而工作气压则影响金刚石薄膜晶形的完整性，适当气压下生长的金刚石薄膜致密且晶形完整、清晰。Diamond film was prepared by HFCVD at high growth rate and the microstructure of the film was studied. Raman and XRD analyzed indicate that the film is made of diamond. the lance parameter is as same as that of the natural diamond and without nondiamond carbon and other impurities. SIMS and ACS analyzed show that there are only a little of Na.O .N in the film. SIMS showed that C13is enriched in the film growing process. SEM micrograph show that the dense of diamond is strongly influenced by the surface state of the substance and with perfect. and clear crystal faces.

关 键 词：金刚石薄膜 显微结构 薄膜生长 

分 类 号：TQ163[化学工程—高温制品工业]