金刚石薄膜摩擦学性能研究进展  

Latest progress of tribological properties of diamond films

作　　者：靳慧智[1] 史新伟[1] 陈林峰[1] 姚宁[1] 张兵临[1] 王新昌[1] 

机构地区：[1]郑州大学物理工程学院材料物理教育部重点实验室,河南郑州450052

出　　处：《真空》2009年第3期31-37,共7页Vacuum

基　　金：河南省科技攻关(0624250014);郑州大学培育基金项目

摘　　要：化学气相沉积的金刚石薄膜通常是一种表面粗糙的多晶薄膜,其摩擦系数相对于单晶金刚石明显偏高,制约着其在摩擦学领域的应用。本文介绍了近年来国内外学者为提高金刚石薄膜摩擦学性能而进行的探索研究及其发展现状。简要分析了影响金刚石薄膜摩擦学性能的主要因素,并提出金刚石薄膜应用于摩擦学领域需要重视解决的几个问题。Diamond films grown by chemical vapor deposition are usually a kind of polycrystalline thin films with rough surface, of which the friction coefficient is higher than monocrystalline ones, thus restricting its application in the field of tribology. Describes briefly the latest progress of improving the tribological properties of diamond films in recent years at home and abroad. Analyzing the main influencing factors on the tribological properties of diamond films, some problems of importance to the application of diamond films in the field of tribology are proposed and discussed.

关 键 词：化学气相沉积 金刚石薄膜:摩擦学性能 

分 类 号：TB43[一般工业技术]