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出 处:《真空》2009年第3期42-45,共4页Vacuum
基 金:国家自然科学基金项目(No.60876014);河南省自然科学基金项目(No.0611023800;No.072300410180);河南省高校科技创新人才支持计划(No.2008HASTIT029)
摘 要:使用直流磁控溅射装置,通过在溅射过程中加入不同的金属网格,300℃条件下在玻璃衬底上制备了不同晶粒尺寸的TiO2薄膜。利用X射线衍射谱(XRD)、场发射扫描电子显微镜(SEM)对薄膜的结构和表面形貌进行了分析,并使用紫外-可见分光光度计研究了TiO2薄膜的透射和吸收光谱。研究结果表明:金属网格在磁控溅射过程中能有效减小TiO2薄膜的晶粒尺寸,金属网格的网孔尺寸越小,晶粒尺寸越小,吸收边蓝移越明显。TiO2 thin films with different grain sizes were prepared on the glass substrates via DC magnetron sputtering process at 300℃, during which the different types of metal mesh grids were used. The structure and morphology of the films were characterized by XRD and field emission SEM, and the absorption and transmission spectra of the films were investigated by UV-3100 spectrophotometer. The results showed that the grain size of TiO2 film could be reduced effectively by using the metal mesh grid in the process and the smaller the mesh, the smaller the grain size and the more obvious blue shift of the absorption edge.
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