碳涂层对硅基薄膜激光微等离子体光谱强度的影响  

Effects of Carbon Coating on the Spectral Intensity of Silicon-based Thin Film Laser Micro-plasma

作　　者：冯强[1] 张秋琳[1] 邹昊[1] 崔永亮[1] 怀素芳[1] 郭庆林[1] 

机构地区：[1]河北大学物理科学与技术学院,河北保定071002

出　　处：《河北大学学报（自然科学版）》2009年第2期142-145,共4页Journal of Hebei University(Natural Science Edition)

基　　金：973前期研究专项(2007CB616910);河北省自然科学基金资助项目(A200800565)

摘　　要：为了降低薄膜样品表面对激光的反射率,提高等离子体的辐射强度,改善谱线质量,提出了一种在薄膜表面涂覆碳层的方法,并研究了不同涂层厚度对等离子体谱线强度的影响.实验结果表明,薄膜表面涂覆碳层,可有效减少表面对激光束的反射,提高热耦合效率.当碳涂层厚度15μm左右时热耦合效率最高,激光等离子体的辐射强度明显增强.A method of thin film coated with carbon is introduced in this paper, which can reduce the laser reflection of the film samples, raise the radiation intensity of plasma and improve the quality of spectrum simultaneously. The effects of the coated carbon of different thickness on the spectral intensity are studied at the same time. The results show that the reflection of the laser beam is reduced and the thermal efficiency of coupling is improved. The thermal coupling efficiency is strengthened obviously with the thickness of coated carbon layer is about 15μm.

关 键 词：激光微区等离子体 硅基薄膜 辐射强度 

分 类 号：O433.2[机械工程—光学工程]