N^+注入Ti/Si_3N_4的摩擦行为研究  

THE TRIBOLOGICAL PROPERTIES OF Ti/Si3N4 IMPLANTED BY N IONS

作　　者：田军[1,2,3] 杨晓鸿[1,2,3] 陈玉峰 王齐祖[1,2,3] 薛群基 

机构地区：[1]中国科学院兰州化学物理研究所固体润滑开放实验室 [2]兰州大学材料科学系 [3]中国建筑材料科学研究院技术陶瓷研究所

出　　处：《硅酸盐学报》1998年第2期206-209,共4页Journal of The Chinese Ceramic Society

摘　　要：研究了Ｓｉ３Ｎ４陶瓷材料及镀膜Ｔｉ／Ｓｉ３Ｎ４材料当Ｎ＋注入前后的摩擦学行为，考察了样品表面划痕轨迹的ＳＥＭ形貌，结合Ｘ射线衍射，对离子注入改性机理和摩擦学性能进行了探讨．In this paper, the tribological properties of Si3N4 and Ti/Si3N4 implanted by N ions are studied. The topography of implanting and scratching trace were examined using SEM. By X-ray diffraction for the implanted thin film, the new phase of Ti2N on Ti/Si3N4 layer by N+ implantation was shown. The wear and friction mechanism are also discussed in the paper. Ion beam mixing of interface improves the adhesion between Ti film and Si3N4 substrate.

关 键 词：离子注入 摩擦学 氮化硅陶瓷 钛 镀膜 

分 类 号：TQ174.758[化学工程—陶瓷工业]