新型恒速变向平动双面抛光机设计  

The Design of a New Type Double-sided Polishing Machine with Constant-Velocity and Change-Direction

作　　者：胡晓珍[1] 陈毓[1] 李伟[2] 

机构地区：[1]浙江海洋学院,浙江舟山316000 [2]浙江工业大学,浙江杭州310014

出　　处：《新技术新工艺》2009年第5期49-52,共4页New Technology & New Process

摘　　要：常用行星式双面抛光机中工件及载体的内外缘速差会引起抛光垫变形,降低晶片平面度。本文设计了一种圆平动或摆动式新型双面抛光机,其工件平面相对于抛光盘的运动速度大小恒定,方向沿圆周轨迹的切线方向循序渐变,且能把抛光压力均匀压在载体内的工件上,该新型双面抛光机具有恒速变向抛光的优点,有较高的抛光效率和抛光精度,体积小,结构紧凑。In the common planetary double-sided polishing machine, the difference speed inside-outside the edge of workpiece and carrier can lead to the polishing pad deformation and flatness reduced. In this paper, a new type double-sided polishing machine with circular or swing movement was designed. The working plane of this machine had constant velocity, and an ever changing-direction along the circular polishing path. Moreover, this machine can load polishing pressure on workpiece based on carriers evenly. Therefore, this new type double-sided polishing machine had many advantages, such as constant-velocity and change-direction polishing, higher polishing efficiency and precision, smaller volume and more compact structure.

关 键 词：恒速 变向 双面抛光机 

分 类 号：TG3[金属学及工艺—金属压力加工]