脉冲偏压电弧离子镀C-N-Cr薄膜的成分、结构与性能  

COMPOSITION,MICROSTRUCTURE AND PROPERTIES OF C-N-Cr FILMS DEPOSITED BY PULSED BIAS ARC ION PLATING

作　　者：李红凯[1] 刘琪[1] 林国强[2] 董闯[1] 

机构地区：[1]大连理工大学材料科学与工程学院,大连116085 [2]大连理工大学物理与光电工程学院,大连116085

出　　处：《金属学报》2009年第5期610-614,共5页Acta Metallurgica Sinica

基　　金：国家高技术研究发展计划项目2006AA03Z521和2007AA03Z221资助~~

摘　　要：用脉冲偏压电弧离子镀设备在保持偏压一致和工作气压恒定的条件下,控制不同氮(N)流量,在硬质合金基体上制备了不同成分的C-N-Cr薄膜.用SEM,XPS,GIXRD,激光Raman谱和纳米压入等方法分别研究了薄膜的表面形貌、成分、结构与性能.结果表明,随着N流量增加,薄膜中N含量先是线性增加然后趋于平缓,Cr含量先是基本保持不变然后线性减少.在N流量不超过20 mL/min时,薄膜保持较高的硬度(>30 GPa)与弹性模量(>500 GPa);当N流量超过20 mL/min时,薄膜硬度与弹性模量急剧下降,在N流量为100 mL/min时硬度与弹性模量仅为13.6与190.8 GPa.Diamond-like carbon （DLC）, which used to describe a wide range of amorphous carbon films containing sp^3 bond, has been extensively studied and applied in the fields of mechanics, electronics, optics and medicine, due to their excellent properties, such as high hardness and wear resistance, low friction coefficient, high chemical inertness, low expansion coefficient, well biocompatibility, and so on. However, high internal stress and low thermal stability are the main problems in applications of DLC. On the one hand, high internal stress is generated in the growth process of DLC, which greatly reduces the adhesion strength of the film to substrate, making the film easily delaminate from the substrate. On the other hand, the DLC will graphitize and be obviously oxidized when the temperature is over 350℃, leading to the deterioration of properties evidently. Non-metal N has strong affinity with transition metal Cr and their compound CrN has high hardness and oxidation resistance. So it is expected that composite film with hard CrN crystalline phase imbedded within DLC amorphous matrix maybe obtained by doping N and Cr simultaneously. In this paper, the uniform, smooth and dense C-N-Cr films with different compositions were deposited on cemented carbide substrate at different nitrogen flow rates by pulsed bias arc ion plating. The surface morphology, composition, structure and properties of C-N-Cr films were investigated by SEM, GIXRD, XPS, Raman spectra and Nano-indentation, respectively. The results show that the nitrogen content in the C-N-Cr films increases linearly and then slowly with nitrogen flow rate increasing, while the Cr content first keeps stable and then decreases linearly. The C-N-Cr films have high hardness （〉30 CPa） and elastic modulus （〉500 GPa） when the nitrogen flow rate is not more than 20 mL/min, above which the hardness and elastic modulus decrease drastically and only have the value of 13.6 and 190.8 GPa when the nitrogen flow rate is 100 mL/min.

关 键 词：C-N-Cr薄膜 脉冲偏压 电弧离子镀 结构 性能 

分 类 号：TB43[一般工业技术]