利用射频磁控溅射制作高性能铁磁性薄膜的研究  

Studies on Fe Thin Film by RF Magnetron Sputtering

作　　者：夏洋[1] 于广华[1] 朱逢吾[1] 肖纪美[1] 方光旦[2] 宋庆山[2] 熊鑫恩[2] 

机构地区：[1]北京科技大学 [2]中国科学院计算所

出　　处：《材料工程》1998年第5期31-33,共3页Journal of Materials Engineering

摘　　要：讨论了用射频（ＲＦ）磁控溅射制作铁磁性薄膜工艺，合适的工艺参数能够获得较低的矫顽力Ｈｃ＝６Ｏｅ。用Ｘ射线光电子能谱（ＸＰＳ）和原子力显微镜（ＡＦＭ）研究膜表面情况及氧化深度。In this paper, the process fabricating Fe thin film by RF magnetron sputtering was discussed. Lower coercive force Hc=6 Oe was achieved under optimum parameters. The surface and depth of Fe thin film were studied by xray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM).

关 键 词：巨磁电阻 薄膜 铁磁性 射频磁控溅射 

分 类 号：O484.43[理学—固体物理]