二氧化铪(HfO_2)晶态薄膜的液相自组装制备与表征  

Self-Assembled Monolayers Preparation and Characterization of HfO_2 Film

作　　者：谈国强[1] 贺中亮[1] 苗鸿雁[1] 刘剑[1] 夏傲[1] 

机构地区：[1]陕西科技大学,陕西西安710021

出　　处：《稀有金属材料与工程》2009年第A01期349-352,共4页Rare Metal Materials and Engineering

基　　金：国家自然科学基金项目(50672055);国家科技支撑计划项目(2006BAF02A28);国家自然科学基金项目(50872077)

摘　　要：以硫酸铪和盐酸为原料,采用液相自组装技术,以十八烷基三氯硅烷(OTS)为模板制备了二氧化铪晶态薄膜。通过表面接触角测试仪观察有机层表面接触角变化,探讨了前驱液pH值,薄膜沉积温度和煅烧温度对HfO2薄膜的影响。通过XRD、SEM等测试手段对HfO2薄膜的物相组成、显微结构和表面形貌进行了表征,结果表明:利用自组装技术在500℃热处理后成功制备出了立方相HfO2晶态薄膜,当沉积温度为70～80℃,HCl浓度为0.3mol/L时,HfO2薄膜表面均匀致密,生长良好。An alkyl silane layers on the hydroxylated surface of the glass substrates were prepared via the method of self-assembled monolayers （SAMs）, Hf（SO4）2·4H2O and HCl were used as raw materials, and HfO2 thin films were prepared on the active groups of the alkyl silane by the liquid phase deposition （LPD）. Water contact angle of OTS-SAMs irradiated by UV light was studied. The surface configuration and structure of the thin films were characterized and analyzed by water contact angle equipment, SEM and XRD. The results of the characterization indicate that the HfO2 thin films are successfully prepared by the self-assembled monolayers, and the thin films are uniform and dense with cubic microstructures of HfO2. SAMs, pH values, deposition temperatures and calcining temperatures play important roles on the growth of HfO2 thin films.

关 键 词：OTS-SAMs HFO2 薄膜 

分 类 号：TB383.2[一般工业技术—材料科学与工程]