直流反应溅射制备NiO_x薄膜及其电致变色机理研究  

Electrochromic Property and Mechanism of NiO_x Film Fabricated by DC Sputtering

作　　者：杨海刚[1,2] 王聪[1] 朱开贵[1] 刁训刚[1] 王怀义[1] 王天民[1] 

机构地区：[1]北京航空航天大学,北京100083 [2]河南师范大学,河南新乡453007

出　　处：《稀有金属材料与工程》2009年第A01期572-575,共4页Rare Metal Materials and Engineering

基　　金：国家自然科学基金(50772008);新世纪优秀人才支持计划(NCET-05-0197)资助

摘　　要：采用直流反应溅射在ITO导电玻璃上沉积了NiOx薄膜,研究了O2流量对其光学和电致变色性能的影响,利用XRD、SEM和XPS对薄膜的微结构和成分进行了表征。通过循环伏安特性曲线和可见光透射谱对样品的电化学和电致变色性能进行了研究,并且讨论了NiOx薄膜成分与电致变色性能之间的关系。研究发现反应溅射制备的NiOx薄膜是Ni2+和Ni3+混合价态,颜色为淡棕色,随着薄膜中Ni3+成分增加,薄膜颜色变深,调色范围有减小的趋势。NiOx薄膜表现出阳极电致变色特征,作者认为其电致变色的行为是由于Li+和OH-在薄膜中的注入和拉出引起的Ni2+和Ni3+发生转化所致。Nickel oxide films were deposited on ITO coated glass substrates electrochromic （EC） properties of the films were studied with different oxygen by reactive DC magnetron sputtering. The optical and and argon flux ratio in the deposition process. The NiOx films were characterized with X-ray diffraction （XRD）, X-ray photoelectron spectroscopy （XPS） and Scanning electron microscopy （SEM） The electrochromic properties and mechanism were discussed by means of cyclic voltammetry and spectrophotometry. Both Ni^2＋ and Ni^3＋ ions exist in the NiOx films. The films exhibited anodic electrochromism; the coloration and bleaching of NiOx film is associated with insertion and deinsertion of Li^＋, OH ions and electrons in the film.

关 键 词：NIOX 薄膜 反应溅射 电致变色 变色机理 

分 类 号：TB383[一般工业技术—材料科学与工程]