时间依赖性雾(TDH)的产生机理及其消除方法  

Formation Mechanism and Control of Time-Dependent Haze

作　　者：赵丽霞[1,2] 陈秉克[1] 张鹤鸣[2] 

机构地区：[1]河北普兴电子科技股份有限公司,石家庄050200 [2]西安电子科技大学微电子学院,西安710071

出　　处：《半导体技术》2009年第7期669-671,共3页Semiconductor Technology

摘　　要：阐述了Si片表面时间依赖性雾的形成过程、分布、形状、密度及识别和去除的方法。通过同样流程清洗、不同条件干燥处理的Si片在不同湿度条件下储存的实验,指出了时间依赖性雾是H与掺杂原子的联合体以及雾是Si片表面与H2O或O2反应生成SiO2颗粒两种解释的不准确性。提出了时间依赖性雾是含有离子或有机物沾污的水汽在Si表面浓缩而形成的光散射。在总结和比对分析实验结果的基础上,得到了控制时间依赖性雾的生成、延长Si片存储时间的有效方法。The formative process, distribution, shape density, identification and removal method of TDH （time-dependent haze） on the surface of Si wafer were described. By several conditional experiments of dry and storage, the inaccuracy of explanation was pointed out that TDH is the combination of H with dopant atoms and TDH is SiO2 particles. The formation of TDH is that the water with ions and organic contamination condensed on wafer surface results in light diffusion. On the basis of it, the effective methods how to control TDH, extend the storage life were concluded.

关 键 词：时间依赖性雾(TDH) 酸根离子 碱根离子 颗粒 光散射 

分 类 号：TN305[电子电信—物理电子学]