氧压对用PLD法制备的ZnO薄膜的特性影响  

Effect of O_2 Pressure on the Property of ZnO Thin Films Fabricated by PLD

作　　者：魏显起[1] 张铭杨[1] 满宝元[2] 

机构地区：[1]济南大学理学院,山东济南250022 [2]山东师范大学物理与电子科学学院,山东济南250014

出　　处：《济南大学学报（自然科学版）》2009年第4期376-379,共4页Journal of University of Jinan(Science and Technology)

基　　金：山东省自然科学基金(2008A21);国家自然科学基金(10474059)

摘　　要：通过脉冲激光沉积方法在不同的氧压中制备ZnO薄膜。用X射线衍射(XRD)谱、原子力显微镜(AFM)及光学透过率谱表征了薄膜的结构和光学特性。XRD谱和AFM显示在生长压力为2Pa时获得了较好的结晶薄膜,随着氧压的提升薄膜表面平整,晶粒均匀。光学透过率谱显示在生长压力为5Pa时有较好的光学特性。ZnO thin films were grown at various O2 pressure by pulsed-laser deposition. The structure and optical properties of ZnO thin films were investigated by X-ray diffraction （XRD）, atomic force microscopy （AFM） and optical transmittance spectra. XRD and AFM results show that the crystal quality is perfect for the ZnO film grown at a pressure of 2Pa, and with increasing O2 pressure thin films have even surfaces and crystal grains. Optical transmittance spectra show that the ZnO film possesses good optical property at O2 pressure of 5 Pa.

关 键 词：PLD ZNO薄膜 晶体结构 表面形貌 光学特性 

分 类 号：O469[理学—凝聚态物理]