基底诱导聚合物相分离制备高度有序图形的研究  

SUBSTRATE-INDUCED POLYMER BLEND PHASE SEPARATION FOR PREPARING HIGHLY UNIFORM PATTERNS

作　　者：白桦[1] 巫国平[1] 熊玉卿[2] 张莉[1] 郭云[2] 常梦洁[1] 张浩力[1] 

机构地区：[1]兰州大学化学与化工学院,功能有机分子化学国家重点实验室,甘肃兰州730000 [2]兰州物理研究所,表面工程技术国家级重点实验室,甘肃兰州730000

出　　处：《真空与低温》2009年第2期76-80,共5页Vacuum and Cryogenics

基　　金：表面工程技术国家级重点实验室基金(9140C5401030701)资助。

摘　　要：基底诱导聚合物相分离是一种制备高度有序图形化高分子薄膜的新技术。研究考察了PS/PVP共混物在图案化基底上的相分离图形化的影响因素。实验证明,聚合物薄膜的膜厚对图形的质量有着重要的影响。薄膜厚度过薄(小于100nm)反浸润现象导致薄膜不连续;薄膜很厚(大于300nm)时基底的诱导效应减弱。而在合适的膜厚情况下(约140nm),基底图案对聚合物膜的表面形态有最好的诱导效果。另一个关键因素是基底图案的周期,当周期与聚合物本征颗粒的尺寸相近时图形化效果最好。Substrate induced polymer blend phase separation is a new and attractive method for fabricating highly uniform polymer patterns. The factors affect the phase separation of PS/PVP blend on chemically patterned substrates was investigated. It was found that polymer film thickness plays a key role to the pattern quality. Dewetting occurred when the film thickness is relative thin （〈100 nm）. When the film is too thick （〉300）, the influence from the substrate becomes less effective. At the optimum thickness, around 140 nm in this work, the best pattern replication was observed. Another important factor is the periodicity of the chemical pattern. The best pattern replication took place when the period of the chemical pattern matches the intrinsic size of the polymer particles.

关 键 词：聚合物共混物 纳米技术 微接触印刷 相分离 图案化 

分 类 号：TQ316.342[化学工程—高聚物工业]