波长小于10nm的软X射线多层膜制备技术  

Preparation Technologies of Soft X-ray Multilayers at Wavelengths below 10nm

作　　者：雷洁红[1] 邢丕峰[1] 唐永建[1] 吴卫东[1] 

机构地区：[1]中国工程物理研究院,绵阳621900

出　　处：《材料导报（纳米与新材料专辑）》2009年第1期245-246,250,共3页

基　　金：国家高技术研究发展计划（863）

摘　　要：软X射线短波段区域（1～10nm）高反射率多层膜的制备对软X射线光学的研究具有十分重要的意义。该波段要求镀膜过程中能减小界面扩散，实现膜厚控制，从而严格限制了制备技术的应用。介绍了软X射线短波段多层膜的发展现状和制备技术，主要包括蒸发沉积、溅射沉积、脉冲激光沉积技术和激光分子束外延，对这些方法进行了比较并提出了今后的研究方向。Fabrication of multilayers holding high reflectivity in short wavelength range （1-10nm） for soft X-ray takes on important meanings for investigation of soft Xray optics. In the wavelength region, it is requested to minish pervasion of interface and control thickness of films during the coating process, which rigorously restricts preparation technolo- gies. The development situation of soft Xray multilayers in short wavelength range and preparation technologies including evaporation deposition, sputtering deposition, pulsed laser deposition and laser molecular beam epitaxy are introduced. These preparation technologies are compared and their development trends are outlined.

关 键 词：软X射线多层膜 表面粗糙度 制备技术 

分 类 号：O484[理学—固体物理] TN304[理学—物理]