玻璃衬底和Si衬底制备的Zn0.96Nd0.04O薄膜的结构研究  

Investigation of Structural of Zn0.96Nd0.04O Thin Films Grown on Glass and Si Substrate

作　　者：文军[1] 

机构地区：[1]渭南师范学院物理与电子工程系,陕西渭南714000

出　　处：《中国材料科技与设备》2009年第4期48-50,共3页Chinese Materials Science Technology & Equipment

基　　金：基金项目：陕西省教育厅科研计划资助项目（08JK287）;渭南师范学院科研基金项目（09YKS004）

摘　　要：通过射频磁控溅射技术在玻璃衬底和Si（111）村底上制备了Zn0.96Nd0.04O薄膜。XRD分析表明，Zn0.96Nd0.04O薄膜是具有C轴择优生长的纳米多晶薄膜，Nd以替位原子的形式存在于ZnO晶格，Nd掺杂没有改变ZnO晶格结构。从AFM图中看出，薄膜表面形貌较为粗糙，Si衬底薄膜的晶粒具有规律且晶粒尺寸大于玻璃衬底。The Zn0.96Nd0.04O thin films were deposited on glass substrate and Si（111） substrate by RF magnetron sputte- ring, The X-ray diffraction（XRD） analysis revealed that Zn0.96Nd0.04O thin films was highly c-axis orientation and the thin films are nano-multi-crystal. The films with roughness surface morphology were observed by atomic force microscopy （AFM）, the thin films＇ grains which on Si substrate was larger than glass substrate.

关 键 词：ND掺杂 ZNO薄膜 XRD AFM 

分 类 号：O484.1[理学—固体物理] O484.4[理学—物理]