氧氩比对低活化马氏体钢表面氧化铪涂层性能的影响  

Characterization of hafnium oxide coatings on low activation Martensitic steel at various O_2/Ar flow ratios

作　　者：宋斌斌[1] 吴平[1] 周多文[1] 闫丹[1] 赵以德[1] 赵守田[1] 张师平[1] 陈森[1] 

机构地区：[1]北京科技大学物理系,北京100083

出　　处：《核技术》2009年第7期521-524,共4页Nuclear Techniques

摘　　要：本文采用射频磁控溅射法在不同氧氩比下制备氧化铪涂层。研究了涂层的沉积速率、表面形貌、微观结构和电绝缘特性随氧氩比的变化。结果表明用此方法在低活化马氏体钢上制备的氧化铪涂层表面致密、无明显孔洞;低活化马氏体钢为衬底时涂层较易结晶为以单斜相为主的晶体结构;且涂层的绝缘特性受氧氩比影响较大,氧氩比为0.7和1.2下制备的涂层击穿场强小于1MV/cm,电绝缘特性较差,在较低氧氩比下制备的涂层有较理想的绝缘性能。Hafnium oxide coatings were prepared at various O2/Ar flow ratios by RF（radio frequency） magnetron sputtering on low activation Martensitic steel. The effects of O2/Ar flow ratio on the deposition rate and the properties of HfO2 are studied. The results show that the deposition rate decreases with increasing the O2/Ar flow ratio. Moreover, the coatings prepared at various O2/Ar flow ratios are compact and the main phase of the coatings is monoclinic. Additionally the coatings prepared at the O2/Ar ratios 0.7 and 1.2 were broken down under 1 MV/cm and show poor electrical insulation properties, while the coatings prepared at smaller O2/Ar flow ratios show better electrical insulation properties.

关 键 词：射频磁控溅射 氧化铪 X射线衍射 绝缘涂层 

分 类 号：O484.1[理学—固体物理] TG17[理学—物理]