用点渲染算法实现光刻胶显影过程的三维模拟(英文)  

Simulation of Point Based Rendering for Three Dimensional Lithography Development

作　　者：崔滨[1] 万旺根[1] 吴永亮[1] 金龙存[1] 杨晓东[1] 

机构地区：[1]上海大学通信与信息工程学院,上海200072

出　　处：《应用科学学报》2009年第4期375-380,共6页Journal of Applied Sciences

基　　金：the National Natural Science Foundation of China(No.60873130);the"863"National High-Tech Research andDevelopment Program of China(No.2007AA01Z319);the Shanghai's Key Discipline Development Program(No.J50104);InnovationFoundation for Graduate Student of Shanghai University(No.06820113)

摘　　要：用顶点和面片三维显示光刻胶显影模拟结果的方法不支持海量数据。为此提出基于层次结构的三维场景绘制点渲染算法,并引入网格插值法填补显影模拟中在光刻胶表面出现的空洞,用Dill算法、Kim模型和介质光线算法建立光刻显影模型。实验结果表明,该方法能高效、精确、实时地绘制光刻显影模型输出的大规模海量数据。Simulation results are presented with vertices and polygons which did not adequately support display of complex scenes of point-cloud data when using traditional methods. Thus we use a hierarchical point-based representation algorithm for rendering, and introduce a mesh-interpolation algorithm to fill the gaps in the advance of the surface. Meanwhile, a model for lithography development based on the Dill algorithm, the Kim model and the ray algorithm is established. Experimental results show that the hierarchical point-based rendering algorithm is effective for the real-time realization of large-scale 3D visualization.

关 键 词：点渲染 光刻显影 层次细节结构 

分 类 号：TP391.9[自动化与计算机技术—计算机应用技术]