纳米级双面抛光机控制系统设计  

Control System Design of the Two-sided Polishing Machine at Nanometer Level

作　　者：胡晓珍[1] 胡晓冬[2] 李伟[2] 

机构地区：[1]浙江海洋学院,浙江舟山316000 [2]浙江工业大学,浙江杭州310032

出　　处：《机床与液压》2009年第8期112-115,共4页Machine Tool & Hydraulics

基　　金：浙江省自然科学基金项目(M503049);浙江省科技厅重点项目(2004C21007);舟山市科技局项目(05114)

摘　　要：设计了纳米级双面抛光机的控制系统,对其实现方法进行了研究,分析了控制系统的组成,提出并建立了基于微机统一控制系统的解决方案。采用WindowsCE软件平台,图形化界面功能指示、高可靠性的实时操作系统、高精度光栅传感器、压力传感器、数字阀组成电气联合控制系统,应用新型电气直接数字控制技术实现该机的自动加工。The control system of the ultra-precision two-sided polishing machine at nanometer level was designed, its realization method was studied, its structure was analyzed and the solution based on the microcomputer common control system was proposed. Electricity control system was built by using Windows CE software platform, graphic interface function indicator, realtime operating system of high reliability, high accuracy grating sensor, pressure transmitter, digital valve. The automatic processing of the machine was realized by the new electricity direct digital control technology.

关 键 词：超精密 双面抛光机 直接数字控制 

分 类 号：N273.5[自然科学总论] TG580.5[金属学及工艺—金属切削加工及机床]