具有择优取向性的基材表面的薄膜厚度的X射线衍射测量修正  

Thickness Measurement of Thin Film on Polycrystalline Preferred Orientation Material by X-Ray Diffraction

作　　者：张延志[1] 赖新春[1] 管卫军[1] 王勤国[1] 

机构地区：[1]表面物理与化学国家重点实验室,绵阳621907

出　　处：《无损检测》2009年第8期628-630,638,共4页Nondestructive Testing

基　　金：国防基础科研课题资助项目(A1520070073)

摘　　要：根据薄膜对X射线的吸收效应,利用X射线衍射方法可测量出多晶基材表面的薄膜厚度。但试验结果显示,基材的择优取向效应对薄膜厚度的测量影响显著。根据理论分析,提出了择优取向修正方法。在对X射线衍射数据进行择优取向修正后,利用最小二乘法对修正后的数据进行拟合。拟合结果显示,该方法可以有效地对基材的择优取向效应进行修正,从而获得较为准确的薄膜厚度值。Thickness measurement based on the absorption of X-rays in film had been tested on polycrystalline substrate using X-ray diffraction. The diffraction angle （2θ） had fixed and incidence angles had changed continuously during collection data The intensity of substrate reflection was measured to count the thickness of film. The result indicated the preferred orientation of substrate was effective on the account observably. A technique was found to correct the effect of preferred orientation.

关 键 词：X射线衍射 择优取向 厚度测量 基材 薄膜 

分 类 号：TG115.28[金属学及工艺—物理冶金]