K424合金镀金膜后红外发射率变化  

Infrared Emissivity Change of Superalloy K424 with Deposited Au Film

作　　者：黄智斌[1] 朱冬梅[1] 唐秀凤[1] 周万城[1] 罗发[1] 

机构地区：[1]西北工业大学凝固技术国家重点实验室,陕西西安710072

出　　处：《稀有金属材料与工程》2009年第8期1402-1405,共4页Rare Metal Materials and Engineering

基　　金：凝固技术国家重点实验室(西北工业大学)自主研究课题

摘　　要：研究了表面镀金膜的K424合金在热处理前后红外发射率的变化和变化机制。XRD分析结果表明,在热处理后基体金属元素扩散到金膜中,并主要形成了Cr在Au中的固溶体—Au0.7Cr0.3。EDXS分析表明,粗糙表面镀金膜的试样在热处理后,表面主要形成了基体金属元素的氧化物;而抛光表面镀金膜的试样,其表面仍为金膜。通过SR5000光谱辐射计量仪测量合金的红外发射率,结果表明,合金的表面状态和热处理对红外发射率均有较大影响。The change and its mechanism of the infrared emissivity of superalloy K424 with deposited Au film before and after heat treatment were investigated. XRD analyses show that the metal elements of the substrate diffused from the alloy into the Au film, and mainly formed the solid solution of Cr in Au, i.e. Auo.TCro.3. EDXS analyses show that oxides of substrate metal element were formed on the rough surface of the sample with deposited Au film after heat treatment; while the polished surface of the sample was still Au film. Both the surface state and heat treatment have great influence on the infrared emissivity tested by spectral radiometer, SR5000.

关 键 词：镍基高温合金 金膜 红外发射率 

分 类 号：TG174.41[金属学及工艺—金属表面处理]