标准CMOS工艺的外层型人工视网膜芯片设计  

Design of subretinal artificial chip based on standard CMOS technology

作　　者：彭承琳[1] 夏露[1] 侯文生[1] 王星[1] 郑小林[1] 阴正勤[2] 

机构地区：[1]重庆大学生物工程学院,重庆400030 [2]第三军医大学西南医院眼科,重庆400038

出　　处：《重庆大学学报（自然科学版）》2009年第8期859-863,共5页Journal of Chongqing University

基　　金：国家自然科学基金资助项目(30470469);国家'863'计划资助项目(2007AA04Z324);重庆市自然科学基金资助项目(CSTC2006BB3146)

摘　　要：针对外层型视网膜修复技术中芯片像素密度难以提高的问题，设计了一种具有更小尺寸及更高像素密度的视网膜芯片。芯片采用CHRT公司0．35肚m标准CMOS工艺，选用双向驰张振荡器电路作为基本像元电路，在Cadence软件平台上进行了电路的调试及版图制作和后仿真。实验结果表明，像元电路能够随光电流大小变化输出幅值及频率可调的脉冲信号对视网膜神经细胞进行有效刺激，版图制作后仿真得到像元电路脉冲宽度为0．26ms，频率为18～503HZ，版图大小为65μm×65μm，初步设计的芯片大小为1．1mm×1．1mm。芯片各项参数均能满足生理学上对视网膜神经细胞进行有效刺激的要求，实验结果为芯片后续研究提供了良好的基础。A chip with smaller size and higher pixel density was designed to increase the chip＇s pixel density in subretinal prosthesis. This chip was designed on 0.35 μm standard CMOS（complementary metal oxide semiconductor） technology of CHRT company, while the double inverter relaxation oscillator was chosen as the basic pixel circuit. By creating layout on Cadence software, the circuit was debugged and simulated. The experiment results show that the pixel circuit provide effective pulse signals whose values and frequencies can vary with photocurrent to stimulate retinal nerve cells. For the simulated layout, the pulse width was 0.26 ms, the frequency was 18~503 Hz, the pixel size was 65μm×M65μm, and the chip size was 1.1 min× 1.1 mm. All of the parameters can satisfy the requirement to stimulate retinal nerve cells in physiology. The experiment results provide a good foundation for the following research.

关 键 词：视网膜芯片 外层型人工视网膜修复 标准CMOS工艺 电刺激 

分 类 号：R318.18[医药卫生—生物医学工程]