热氧化温度对非平衡磁控溅射TiN镀层的影响  

Influence of oxidation temperature on microstructure and properties of unbalanced magnetron sputtered TiN coatings

作　　者：梁戈[1] 白力静[1] 蒋百灵[1] 

机构地区：[1]西安理工大学材料科学与工程学院,陕西西安710048

出　　处：《兵器材料科学与工程》2009年第4期4-7,共4页Ordnance Material Science and Engineering

基　　金：国家"863"科技攻关项目(2005AA33H010);西安理工大大学科研基金项目(101-210603)

摘　　要：通过SEM和XRD法,研究不同热氧化温度下闭合场非平衡磁控溅射离子镀技术制备的TiN镀层形貌、相结构及性能的变化。结果表明:非平衡磁控溅射离子镀TiN镀层在700℃以下性能基本稳定,具有良好的热氧化性能,尽管600℃时生成少量TiO2相,但600℃之前断口形貌及组织结构保持稳定;700℃时镀层的单位质量氧化增重率迅速增加,氧化曲线出现拐点,镀层失效。The effects of oxidation temperature on the morphology,microstructure and phases of TiN coatings deposited by closed field unbalanced magnetron sputter ion plating（CFUBMSIP） were studied by SEM and XRD.The results show that properties of TiN coatings deposited by CFUBMSIP are stable below 700 ℃,which exhibit excellent thermal oxidation properties.The cross-sectional morphology and structure are stable when coating treated at 600 ℃,despite the presence of small amount of TiO2.Due to the dramatically increase of weight gain for coatings, the oxidation curve shows an inflexion at 700 ℃, and the coating fails at this temperature.

关 键 词：TIN镀层 热氧化 非平衡磁控溅射 

分 类 号：TG174.44[金属学及工艺—金属表面处理]