SiO_2单层膜的反常色散研究  

Anomalous Dispersion of SiO_2 Single-layer Coating

作　　者：李香波[1,2] 高劲松[1] 王彤彤[1,2] 王笑夷[1] 陈红[1] 郑宣明[1] 申振峰[1,2] 朱华新[1,2] 尹少辉[1,2] 刘小涵[1,2] 王珊珊[1,2] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所,长春130033 [2]中国科学院研究生院,北京100049

出　　处：《光子学报》2009年第8期2006-2010,共5页Acta Photonica Sinica

基　　金：国家自然科学基金(60478035)资助

摘　　要：利用等效折射率概念分析了SiO2单层膜反常色散出现的原因,并在1.1m镀膜机上证明了理论分析的合理性.结果表明,理论分析与实验结果一致,沿薄膜厚度方向折射率的对称周期变化使薄膜的等效折射率变化在可见光波段与致密膜层的变化不一致,表现出反常色散的现象.膜厚方向折射率变化周期越大,等效折射率随波长增加的趋势就越大,薄膜表现出的反常色散特性越明显.沿膜厚方向折射率变化幅度的对色散特性影响次之.Utilizing the concept of equivalent refractive index,the dispersive model of single SiO2 layer was presented based on the discussion of refractive index variation with the incident flux angle.The dispersion and transmittance curves of the SiO2 films were obtained.The experiment shows that it is periodic variation of refractive index along film thickness that made its equivalent refractive index related to wavelength different to the one of dense film.The larger the index variation range and its period along film thickness,the more anomalous dispersion the films performed.

关 键 词：光学薄膜 反常色散 等效折射率 变折射率 

分 类 号：O484[理学—固体物理]