自组装制备二氧化铪图案化薄膜  

Self-assembled Monolayers Preparation of Patterned HfO_2 Thin Film

作　　者：谈国强[1] 贺中亮[1] 苗鸿雁[1] 刘剑[1] 夏傲[1] 娄晶晶[2] 

机构地区：[1]陕西科技大学教育部轻化工助剂化学与技术重点实验室,西安710021 [2]河南大学法学院,开封475001

出　　处：《无机化学学报》2009年第10期1853-1857,共5页Chinese Journal of Inorganic Chemistry

基　　金：国家自然科学基金项目(No.50672055;50872077);国家科技支撑计划项目(No.2006BAF02A28);陕西科技大学研究生创新基金项目资助

摘　　要：采用短波紫外光(UV)在十八烷基三氯硅烷(OTS)自组装单分子层刻蚀不同的微型图案,利用液相自组装技术在OTS模板表面沉积HfO2图案化薄膜。通过XRD、AFM、SEM、EDS等测试手段对OTS膜和HfO2薄膜进行表征,结果表明:以OTS为模板利用液相自组装技术成功制备出边缘轮廓清晰、粗糙度较小、条纹宽度为10μm的立方晶型的HfO2图案化薄膜。Different kinds of micro-patterns were created within octadecyltrichlorosilane （OTS） self-assembled monolayers utilizing UV lithography. The HfO2 pattern films have been formed on silanol SAMs by the liquid-phase deposition （LPD） method. The crystal phase composition, microstructure and topography of the as-prepared films were characterized by various techniques, including X-ray diffraction （XRD）, scanning electron microscopy （SEM）, atomic force microscopy （AFM）, and energy disperse spectroscopy （EDS）. The results indicate that the HfO2 pattern films were successfully prepared by the self-assembled monolayers, and the thin films had cubic pattern microstructure of HfO2, 10 μm deposited lines width and small line edge roughness.

关 键 词：OTS-SAMs 图案化 HFO2薄膜 

分 类 号：TB43[一般工业技术] TQ134.13[化学工程—无机化工]