氧化锌薄膜的阴极电沉积法制备及性能  

Preparation and Characteristics of ZnO Film by Cathodic Electrodeposition Method

作　　者：刘志锋[1,2] 雅菁[2] 辛颖[2] 鄂磊[2] 赵丹[2] 

机构地区：[1]天津大学化工学院,天津300072 [2]天津城市建设学院材料科学与工程系,天津300384

出　　处：《天津城市建设学院学报》2009年第3期222-227,共6页Journal of Tianjin Institute of Urban Construction

基　　金：中国博士后科学基金(20080440674);教育部科学技术研究重点项目(208008);天津市高等学校科技发展基金(20071204);建设部科技计划项目(2007-K1-30)

摘　　要：以硝酸锌溶液为沉积液,采用阴极电沉积技术在ITO导电玻璃基片上制备ZnO薄膜.分析了Zn(NO3)2体系ZnO的电化学沉积机理及反应过程,考察了沉积电位和Zn(NO3)2浓度对沉积过程、薄膜结构及其性能的影响.结果表明:沉积电位和Zn(NO3)2浓度对薄膜形貌都有着显著的影响,沉积速率随沉积电位和Zn(NO3)2浓度的增加而增大;当沉积电位和Zn(NO3)2浓度较小时,薄膜粒径小,透光性相对较高.ZnO films were electrodeposited on conducting glass substrate from an aqueous solution containing Zn（NO3）2 as electrolyte. The deposition principle and process of ZnO were described. The effects of deposition potential and Zn（NO3）2 concentration on the deposition process, structure and characteristics of films were also studied. The results showed that deposition potential and Zn（NO3）2 concentration had great influences on the morphology of films. And, deposition rate increased with the increasing of technologic parameters. A film with small crystalline and high optical transmittance couldbe obtained at low deposition potential and Zn（NO3）2 concentration.

关 键 词：氧化锌薄膜 阴极电沉积法 沉积电位 沉积液浓度 透光性 

分 类 号：TB43[一般工业技术] O484.1[理学—固体物理]