三维纳米结构氧化锌的制备  

Preparation of 3-D Nano-structured ZnO

作　　者：张祥涛[1] 吴起白[1] 张海燕[1] 魏爱香[1] 刘俊[1] 

机构地区：[1]广东工业大学材料与能源学院,广东广州510006

出　　处：《河北师范大学学报（自然科学版）》2009年第6期740-743,共4页Journal of Hebei Normal University：Natural Science

基　　金：广东省自然科学基金(070122)

摘　　要：采用两步溶液法在硅片表面制备了新颖的三维纳米结构氧化锌,并采用SEM和XRD等手段对其进行了表征.两步溶液法制备实验表明:当氧化锌种子层的生长制备时间在48 h、种子层外延生长时间超过7 h,在硅片表面就能得到三维纳米结构氧化锌.对三维纳米结构氧化锌的生长机理进行了初步探究.A novel 3-D nano-structured ZnO has been prepared by two-step solution method on the surface of silicon and characterized by SEM and XRD. The experiments show that：if the preparation time of seed layer of ZnO is 48 h, the seed layer epitaxial growth time is more than 7h, 3-D nano-structured ZnO will be got on the silicon. And the growth mechanism of three-dimensional ZnO nanostructures is studied is studied.

关 键 词：溶液法 氧化锌种子层 三维纳米结构氧化锌 

分 类 号：O471.4[理学—半导体物理]