真空室内表面镀TiZrV抽气层的性能研究  

Gettering of TiZrV Coatings on Pipe Inner-Walls of Vacuum System

作　　者：蒙峻[1,2] 杨晓天[1] 张军辉[1] 杨伟顺[1] 何源[1] 赵玉刚[1] 胡振军[1] 郭迪周[1,2] 马向利[1] 侯生军[1] 

机构地区：[1]中国科学院近代物理研究所,兰州730000 [2]中国科学院研究生院,北京100049

出　　处：《真空科学与技术学报》2009年第6期678-681,共4页Chinese Journal of Vacuum Science and Technology

摘　　要：采用直流磁控反溅射法在不锈钢真空管道内表面均匀镀上一层TiZrV薄膜。该薄膜经过激活后具有抽气效应,能够使真空管道由原来的系统气载转变成为管道泵。该薄膜激活温度很低,最低激活温度为180℃。在经过激活后,实验装置远端的真空度与泵口真空度相同,因此压力分布呈直线型。A novel technique was developed to turn the gas-load of the long,narrow stainless-steel pipes in vacuum system into non-evaporation getters （NEG）. In the technique, the TiZrV films were grown by DC reactive magnetron sputtering on the inner walls of the pipes. The microstructures and compositions of the TiZrV coatings were characterized with scanning electron microscopy （SEM）. The impacts of the activation conditions, including the activation temperature and time, on the gettering characteristics were studied. The results show that the TiZrV film, after activation at a lowest temperature of 180℃ ,is capable of gettering. The pressures at the remote end of the experimental setup and the pump inlet were found to be almost the same with a linear pressure distribution.

关 键 词：直流磁控溅射 TiZrV抽气层 低温激活 压力分布 

分 类 号：TQ621.12[化学工程—精细化工] TQ174.764