ZnO/glass薄膜结构和电学性质研究  

Structural and Electrical Properties of ZnO/glass Films

作　　者：吴云龙[1] 刘益环[1] 赵芳红[1] 欧迎春[1] 张保军[1] 左岩[1] 

机构地区：[1]中国建筑材料科学研究总院,北京100024

出　　处：《武汉理工大学学报》2009年第22期91-94,共4页Journal of Wuhan University of Technology

摘　　要：利用脉冲激光溅射技术,分析了玻璃基片上ZnO薄膜的生长、结构、形貌以及电输运性质。X射线衍射表明ZnO薄膜为c轴取向的六角纤锌矿结构。ZnO晶粒的直径约200 nm,表面粗糙度RMS^4 nm。ZnO薄膜与Ag电极间电流-电压曲线呈线性并对称关系,表现为很好的欧姆接触,还讨论了ZnO和Ag电极间接触与两者功函数的关系。In this investigation, ZnO films have been deposited on glass substrates by pulse Laser deposition method and morphology, mierostructure and electric properties of the ZnO films are researched. The X-ray diffraction researches reveals that the films are c-axis orientation with a hexagonal wurtzite structure. The grain size of ZnO films is about 200 nm and smooth surface with the RMS is about 4 nm. The current-voltage characteristic is linear and symmetric relationship which means an ohmic contact between the ZnO film and Ag. The relationship of the contact between ZnO and Ag and the work function is discussed in the paper.

关 键 词：ZNO薄膜 脉冲激光溅射 表面形貌 结构 电学性质 

分 类 号：O469[理学—凝聚态物理] O484[理学—电子物理学]