对《L-B膜绝缘层》在常温下的CV特性研究  

C V PROPERTY IN ORDINARY TEMPERATURE ON L B FILM INSULATION LAYER

作　　者：孙飞[1] 王艳博[1] 翼文芝 

机构地区：[1]佳木斯医学院物理学教研室

出　　处：《中国医学物理学杂志》1998年第4期202-204,共3页Chinese Journal of Medical Physics

摘　　要：测定了多种具有金属／Ｌ－Ｂ膜绝缘层／半导体（Ｓｉ）结构的纳米厚度有机功能膜的Ｃ－Ｖ特性。C V property of organic function film is measured for some kind of laminanted layer structure of metal、L B film insulation layer and semiconducters with nanometer thickness.It is found that C V property is affectd by molecular organization composition and oxygenated film thickness.

关 键 词：L-B膜 C-V特性 分子组分 氧化膜 

分 类 号：R318.08[医药卫生—生物医学工程]