1064nm激光平板偏振膜的研制  

Study and fabrication of 1064nm laser flat polarizer

作　　者：贺才美[1] 陈德江[1] 涂建军[1] 缪金义 陈忠[1] 杜亚清 

机构地区：[1]江苏曙光光电有限责任公司光学制造部,江苏扬州225009

出　　处：《激光与红外》2009年第12期1337-1340,共4页Laser & Infrared

摘　　要：根据军用光学仪器的使用要求,在平板K9基底上镀制偏振膜,要求在56.4°角入射条件下,激光波长1064 nm处满足TP>99%,TS<1%,且膜层抗激光损伤阈值应≥600 MW/cm2。采用电子束真空镀膜的方法并加以离子辅助沉积系统,通过选择HfO2和SiO2作为高低折射率材料,利用Macleod软件进行膜系设计与分析,采用LightRatioPeak光值比例法进行监控,优化工艺参数,减少监控误差,在平板K9基底上成功镀制符合使用要求的偏振膜。所镀膜层不仅满足光谱要求,且顺利通过膜层环境测试,完全满足军用光学仪器的使用要求。Aiming at the using requirements of the military optical instrument, we deposit laser flat polarizer on substrate of K9 flat glass. With incident angle 56.4° ,at the wavelength 1064 nm, Ts is higher than 99%, Ts is less than 1% , and the laser-induced damage threshold over 600 MW/cm2. We adopt electronic beaming vacuum depositing method with the aid of ion assistant deposition systems, chose HfO2 and SiO2 as the material of high and low refractive index, using Macleod software to design and analyse the film structure and LightRatioPeak as monitor method, through optimizing technical parameters and reducing thickness error, we successfully deposit polarizer on the substrate of K9 flat glass to achieve the requirements. The coating not only satisfies the spectral requirements, but also passes the environment testing, it perfectly meet the applying demand of military optical instruments.

关 键 词：光学薄膜 平板偏振膜 真空镀膜 离子辅助沉积 激光损伤阈值 

分 类 号：O484.1[理学—固体物理]