Effects of Surface Etch Hole Fault on the Velocity Field in Microchannel Reactors  

作　　者：尤学一 李胜华 

机构地区：[1]School of Environmental Science and Engineering, Tianjin University, Tianjin 300072, China [2]School of Chemical Engineering, Tianjin University, Tianjin 300072, China

出　　处：《Chinese Journal of Chemical Engineering》2009年第6期919-924,共6页中国化学工程学报（英文版）

基　　金：Supported by the National Natural Science Foundation of China （20676093）.

摘　　要：Microchannel reactors are commonly used in micro-chemical technology. The performance of microreactors is greatly affected by the velocity field in the microchannel. The flow field is disturbed by the cylindrical etch holes caused by air dust on the microchannel surface during its processing procedure. In this approach, a two-dimensional computational fluid dynamics （CFD） model is put forward to study the effect of etch holes on flow field. The influenced area of single or two concave etch holes is studied for the case of laminar flow. The hole diameter, the Reynolds number and the distance between the center of holes are found to have influences on the flow field. Numerical results indicate that the effects of etch hole on the flow field should be evaluated and the way of choosing the economic class of cleanroom for microreactor manufacture is presented.微通道反应堆通常在微化学药品的技术被使用。微反应堆的表演极大地在微隧道受速度地影响。流动地被扰乱由圆柱蚀刻坐飞机在它的处理过程期间在微隧道表面上引起灰尘的洞。在这条途径，一个二维的计算液体动力学(CFD ) 模型被提出学习效果在流动地上蚀刻洞。单身者或二凹面的影响区域蚀刻洞为 laminar 的盒子被学习流动。在洞的中心之间的洞直径，雷纳兹数字和距离被发现在流动领域上有影响。数字结果显示效果在流动领域上蚀刻洞应该被评估，为微反应堆制造选择干净空间的经济班的方法被介绍。

关 键 词：MICROCHANNEL processing faults etch holes computational fluid dynamics velocity field 

分 类 号：TH162[机械工程—机械制造及自动化] TS652[轻工技术与工程]