化学气相沉积制备粉体材料的原理及研究进展  

Principle and research development of powder materials prepared by chemical vapor deposition

作　　者：刘志宏[1] 张淑英[1] 刘智勇[1] 李玉虎[1] 王娟[1] 

机构地区：[1]中南大学冶金科学与工程学院,长沙410083

出　　处：《粉末冶金材料科学与工程》2009年第6期359-364,共6页Materials Science and Engineering of Powder Metallurgy

基　　金：国家自然科学基金资助项目(50704038);高等学校博士学科点专项科研基金资助项目(20060533004)

摘　　要：采用化学气相沉积法(chemical vapor deposition,简称CVD)不仅可以制备金属粉末,也可以制备氧化物、碳化物、氮化物等化合物粉体材料。该法是以挥发性的金属卤化物、氢化物或有机金属化合物等物质的蒸气为原料,通过化学气相反应合成所需粉末,因其制备的粉末纯度高,比表面积大,结晶度高,粒径分布均匀、可控,在粉体材料制备方面的应用日趋广泛。该文主要介绍CVD技术制粉的形成机理和研究进程。CVD法制粉主要包括化学反应、晶核形成、粒子生长以及粒子凝并与聚结4个步骤。按照加热方式不同,CVD技术分为电阻CVD、等离子CVD、激光CVD和火焰CVD等,用这4种技术制备超细粉末各有其优缺点,选择合适的气源,开发更为安全、环保的生产工艺,以及加强尾气处理是使CVD法制备超细粉体材料付诸于工业应用的重要保证。The chemical vapor deposition（CVD） technique can prepare not only metal powder, but also oxide, carbide and nitride powders. The powder prepared by CVD are of excellent advantages as high purity, large specific surface area, high crystallinity, uniform and tunable particle size distribution, so the application of CVD in powder materials synthesis is becoming more and more widely. Generally, the procedures of the CVD process include chemical reaction, nucleation, particulate growth and agglomerate. According to the difference of heating method, CVD is classified as resistance CVD, plasma CVD, laser CVD, flame CVD and so on, the advantages and disadvantages of the four methods mentioned have been discussed in the present paper. It has also been proposed that the proper gas resources, environment-friendly process with good safety, the improvement of treatment of exhaust are important routes for the implementation of the commercial application.

关 键 词：化学气相沉积 生长机理 进展 

分 类 号：TF123.2[冶金工程—粉末冶金]