Ni在Ni(100)面的薄膜生长的蒙特卡罗模拟  

Monte Carlo Simulation of Ni Thin Film Growth on Ni(100) Surface

作　　者：曾令军[1] 冯倩[1] 钟克华[1] 蒋丽钦[1] 黄志高[1] 

机构地区：[1]福建师范大学物理与光电信息科技学院,福建福州350007

出　　处：《福建师范大学学报（自然科学版）》2010年第1期59-63,共5页Journal of Fujian Normal University：Natural Science Edition

基　　金：国家973资助项目(2005CB623605);福建省教育厅资助项目(JB07045);国家自然科学基金项目资助(60876069)

摘　　要：采用晶格动力学蒙特卡罗(KLMC)方法模拟Ni在Ni(100)面的薄膜生长,对原子的沉积、吸附、扩散、成核、生长等微观过程采用了合理的模型,研究基板温度和沉积速率对薄膜的生长形貌和表面粗糙度的影响.模拟结果表明:沉积在基板上的原子逐步由各个离散型变成紧致型的近四方形的岛,并由二维向三维岛转变,最后连接成膜;基板温度越高,沉积速率越低,生成的薄膜越平整,粗糙度越小;沉积速率一定,表面粗糙度随着基板温度的增加而减小,当基板温度达到一定值时粗糙度降为零.The growth of thin Ni film on Ni（100） has simulated by a three-dimensional kinetic lattice Monte Carlo simulation. With the logical model of the atom deposition,atom diffusion and atom growth,etc,the surface feature and surface roughness of Ni thin films have been studied. The results indicate that：many near square compact islands are formed gradually from the dispersive atoms on the surface at the early stage.With increasing deposition time,the film changed from the two-demensions to three-demensions.The higher the substrate temperature is and the lower the deposition rate is, the lower the surface roughness is. As the deposition rate remains unchanged, the surface roughness decreases with increasing substrate temperature. Moreover, the surface roughness becomes zero when the substrate temperature goes up to some value.

关 键 词：蒙特卡罗模拟 薄膜生长 表面粗糙度 沉积速率 

分 类 号：O484.1[理学—固体物理]