电弧离子镀沉积TiN/AlN-TiAlN复合膜的耐磨性  

Wear Resistance of Arc Ion Plating Deposited TiN/AlN-TiAlN Film

作　　者：李争显[1] 王少鹏[1] 潘晓龙[1] 杜继红[1] 王宝云[1] 严鹏[1] 

机构地区：[1]西北有色金属研究院腐蚀与防护研究所,陕西西安710016

出　　处：《装备制造技术》2010年第2期1-2,10,共3页Equipment Manufacturing Technology

基　　金：广西制造系统与先进制造技术重点实验室开放基金项目(桂科能0842006_035_K)

摘　　要：采用高纯铝、钛靶材,通过电弧离子镀工艺在TC4基材上沉积制备了TiN/AlN-TiAlN复合多层膜,用HV-1000型显微硬度计测试了膜层的硬度,用球盘磨损试验对比研究了膜层和基材的耐磨性。结果表明:膜层硬度为2856HV,耐磨性相比基材提高6倍以上。TiN/AlN-TiAlN film were prepared on the Ti-6Al-4V alloy substrate by arc ion plating technique using high pure titanium and aluminum targets. HV-1000 micro-hardness gauge and ball-on-disk wear tester were employed to measured hardness and wear resistance of the TiN/AlN-TiAlN flm. The results show that micro-hardness of TiN/AlN-TiAlN film is about 2856 HV, wear resistance of TiN/AlN-TiAlN film is about 6 times of the Ti-6Al-4V alloy substrate.

关 键 词：电弧离子镀 复合膜 耐磨性 

分 类 号：TG174.44[金属学及工艺—金属表面处理]