多束SPPs干涉成像模拟研究  

Research on SPPs Interference Lithography Imaging Simulation

作　　者：郑宇[1,2] 杨黠[3] 李群华[1] 杜惊雷[2] 

机构地区：[1]武警成都指挥学院教研部,成都610213 [2]四川大学物理科学与技术学院,成都610064 [3]四川理工学院理学院,四川自贡643000

出　　处：《四川理工学院学报（自然科学版）》2010年第1期91-94,共4页Journal of Sichuan University of Science & Engineering(Natural Science Edition)

基　　金：国家自然科学基金资助项目(60676024)

摘　　要：多束SPPs干涉光刻是一种可突破衍射极限的新型纳米加工方法。在分析SPPs激励和传输机理基础上,建立多束SPPs干涉成像模型,编制了能快速准确地计算多束SPPs干涉光刻成像的仿真软件。并在此基础上对多束SPPs的干涉像进行了模拟,发现如果将两束光增加到四束或八束光激发SPPs干涉,则可获得二维分布的周期性光斑点阵,在制作纳米光子晶体材料方面有很强的应用前景。随着入射SPPs的增加,当棱锥棱数足够多近似于一个圆锥时,干涉场会形成一系列的同心圆结构,可考虑实现纳米级波带片的制作。Multi-beam SPPs interference lithography is a kind of the new nano-processing methods which can break the diffraction limit. After analysing the SPPs transmission mechanism of incentives, we build a imaging model of multi-beam SPPs interference and a software which can be prepared quickly and accurately to calculate the multi-beam interference lithography imaging SPPs simulation. Based on this, we have simulated multi-beam interference of SPPs, and found that if the two beams of light to four or eight beam excited SPPs interference, we will receive a two-dimensional distribution of lattice periodic spot, which has a strong application prospects of nano-photonic crystal materials production. As the incident SPPs increase in the number of edges when the pyramid is similar to a cone enough. The interference field will form a series of concentric circles structure, and could be considered to achieve nanometer-level zone plate production.

关 键 词：多束SPPs 干涉光刻 光子晶体 模拟研究 

分 类 号：O436.1[机械工程—光学工程]