磁控溅射Al/Pb纳米多层膜调制结构研究  

Research of Al/Pb Nanometer Multilayer Modulation Structure Deposited by Magnetron Sputtering

作　　者：郭中正[1] 孙勇[1] 段林昆[1] 李玉阁[1] 郭诗玫[2] 

机构地区：[1]昆明理工大学云南省新材料制备与加工重点实验室,云南昆明650093 [2]曲靖师范高等专科学校,云南曲靖655000

出　　处：《昆明理工大学学报（理工版）》2010年第1期38-41,78,共5页Journal of Kunming University of Science and Technology(Natural Science Edition)

基　　金：云南省自然科学基金重点资助项目(项目编号:2004E0004Z);云南省自然科学基金资助项目(项目编号:2006E0018Q)

摘　　要：用磁控交替沉积制备Al/Pb纳米多层膜,运用XPS,AFM,TEM考察表面状况及膜结构.结果表明,实验条件下,当Al层厚60 nm时,Pb子层标定厚度从20 nm增至30 nm,可形成较完整埋层调制结构.随Pb层厚度增加,连续性变好、表面糙度降低,Al层对Pb层表面糙度克服能力提高,改善层状结构完整性.多层膜中Al,Pb子层均存在(111)择优取向特征,由fcc结构的表面自由能最小化引起.Al/Pb nanometer multilayer film is fabricated by magnetron sequential deposition technique. Its struc- ture and surface topography are then investigated by XPS, AFM and TEM. It is shown through the results that a relative complete modulation structure is formed when the nominal thickness of Pb sublayer increases from 20 nm to 30 nm with 60 nm At layer under the experiment conditions. With the increase of the Pb layer thickness, the conti- nuity is increased, the surface roughness decreased, the adjustment effect of AI layer on the surface roughness of Pb layer improved, which ensure the completeness of the muhilayer structure. AI and Pb sublayers in Al/Pb multi- layer film exhibit （ 111 ） texture, which is caused by the minimization of surface free energy of fee structure.

关 键 词：纳米多层膜 调制结构 表面粗糙度 磁控溅射 

分 类 号：TB43[一般工业技术]