温度对化学气相沉积钨组织与表面形貌的影响  

The Effect of Temperature on Microstructure and Surface Topography of Tungsten Prepared via Chemical Vapor Deposition Approach

作　　者：马捷[1] 魏建忠[1] 王从曾[1] 范爱玲[1] 

机构地区：[1]北京工业大学材料科学与工程学院功能材料教育部重点实验室,北京100124

出　　处：《中国表面工程》2010年第1期30-33,共4页China Surface Engineering

摘　　要：以WF6和H2为原料,采用化学气相沉积法在纯铜基体上沉积出难熔金属钨涂层。分析研究了不同沉积温度(500℃,600℃,700℃)沉积层显微组织、表面形貌、表面粗糙度及相关机制。试验分析表明:随沉积温度升高,沉积速率加快,涂层组织柱状晶生长取向趋于杂乱;沉积层表面形貌发生明显改变,表面粗糙度显著增加。杂质颗粒对沉积组织有显著的影响,造成沉积表面粗糙度显著增加。Tungsten coating is prepared successfully on pure copper substrate by chemical vapor deposition using the mixture of WF6 and H2. The microstructure, surface appearance, surface roughness and correlation mechanism of different deposition temperatures with 500 ℃, 600 ℃, 700 ℃ respectively have been analyzed, and the results show that with the increase of deposition temperature, the deposition speed accelerates, the columnar grain microstructure growth tends to disorder, surface appearance undergoes significant changes, and surface roughness also increases on a marked basis. Impurity particles have a significant impact on deposition microstructure, resulting in the marked increase in surface roughness.

关 键 词：化学气相沉积 钨 组织 表面形貌 

分 类 号：TG174.444[金属学及工艺—金属表面处理]