退火对TiO_2磁控溅射薄膜结构和光催化活性的影响  

Effect of Annealing on Microstructure and Photocatalytic Activity of Magnetron Sputtered Titanium Dioxide Films

作　　者：王宏[1] 张文杰[1,2] 朱圣龙[2] 李瑛[2] 王福会[2] 

机构地区：[1]沈阳理工大学环境与化学工程学院,辽宁沈阳110168 [2]中国科学院金属研究所金属腐蚀与防护国家重点实验室,辽宁沈阳110016

出　　处：《材料保护》2010年第2期57-60,共4页Materials Protection

基　　金：国家重点基础研究发展计划(973计划)(2005CB121104);国家自然科学基金(50774074)资助

摘　　要：采用磁控反应溅射制备了纯TiO2薄膜和Fe掺杂的TiO2薄膜,研究了退火对2种TiO2薄膜结构和光催化活性的影响。退火前TiO2薄膜与基体结合良好,退火后薄膜发生了开裂,薄膜与基体的结合变差。TiO2薄膜在700℃以下退火后仍保持着锐钛矿型晶体结构,但衍射峰的强度有明显的增强,说明组成薄膜的晶粒在退火过程中长大;当退火温度高于800℃时,发生了从锐钛矿向金红石型的转变。退火后TiO2薄膜的紫外可见光透射率有较大辐度的下降;甲基橙溶液的光催化降解速率随着退火温度升高而下降。TiO2 film and Fe-doped Tit),film were pre-pared by using reactive magnetron sputtering technique.The effects of annealing on the microstructure and photocatalytic activ-ity of the two types of films were investigated.It was found that the non-annealed films adhered to the substrates well,whereascracks appeared on the annealed films,and the adhesion of the annealed films to the substrates was weakened as well.Besides,the films retained anatase phase after being annealed below 700℃,and the intensity of XRD peaks enhanced apparently,indica-ting crystalline growth during annealing process.After being an-nealed above 800 ℃,the films experienced phase transformationfrom anatase to rutile.Moreover,the ultraviolet-visible light transmittanee and photocatalytic activity of the films significantly decreased with increasing annealing temperature.

关 键 词：TIO2薄膜 磁控溅射 退火 光催化活性 

分 类 号：O643.36[理学—物理化学]