氧气流量对TiO_x薄膜结构和光学特性的影响  

Influence of oxygen flow on structure and optical properties of TiO_x films

作　　者：周继承[1] 荣林艳[1] 赵保星[1] 李莉[1] 

机构地区：[1]中南大学物理科学与技术学院,湖南长沙410083

出　　处：《中南大学学报（自然科学版）》2010年第1期138-143,共6页Journal of Central South University:Science and Technology

基　　金：湖南省科技重大专项资助项目(08FJ1002)

摘　　要：用直流反应磁控溅射法在未加热的玻璃基片上制备出晶态TiOx(x<2)薄膜,研究关键工艺因素即氧气流量对薄膜的沉积速率、表面形貌、显微结构和光学特性的影响。研究结果表明:随着氧气流量增加,薄膜的沉积速率从38.54nm/min下降到3.28nm/min,溅射模式也从转变模式过渡到氧化模式,薄膜表面均方根粗糙度逐渐减小,表面更趋平整;当氧气流量≤5mL/min时,得到不透明的晶态TiOx(x<2)薄膜;当氧气流量>5mL/min时,所沉积的TiOx薄膜呈透明非晶态,薄膜平均透射率高于80%。Well-crystallized structure TiOx（x2） films were prepared on unheated glass by direct current （DC） reactive magnetron sputtering. The influence of oxygen flow on deposition rate, morphology, microstructure and optical properties was discussed. The results show that with the increase of the oxygen flow, the deposition rate decreases significantly from 38.54 nm/min to 3.28 nm/min, which corresponds to sputtering transition from transition mode to oxide mode, the surface root mean square roughness gradually decreases and film surface becomes smoother. When oxygen flow rate is lower than 5 mL/min, opaque TiOx films with well-crystallized structure are obtained. When oxygen flow rate is higher than 5 mL/min, transparent amorphous TiOx films are synthesized and the average transmittance of TiOx films is higher than 80%.

关 键 词：TiOx薄膜 直流反应磁控溅射 氧气流量 

分 类 号：O484[理学—固体物理]