氧化锌薄膜的研究与开发进展  

Development and Applications for Zinc Oxide Thin Film

作　　者：赵谢群[1] 邱向东[1] 林鸿溢[2] 

机构地区：[1]北京有色金属研究总院 [2]北京理工大学电子工程系

出　　处：《半导体技术》1998年第6期8-12,共5页Semiconductor Technology

摘　　要：阐述了ＺｎＯ薄膜材料的结构特点、电学性质和光学特性。分析了薄膜研制、应用与开发现状，展望了产业化发展前景。The development of the micro structural,electrical and optical properties of zinc oxide thin film is introduced.The preparation methods,such as magnetron sputtering,pulsed laser ablation,chemical vapor deposition,sol gel synthesis,and spray pyrolysis are described respectively.The application of the film and its industrialization prospect will be reviewed as well.

关 键 词：制备技术 应用 氧化锌薄膜 

分 类 号：TN304.21[电子电信—物理电子学] TN304.055