光学元件镀膜前高洁净度清洗工艺研究  

High Cleanliness Ultrasonic Cleaning Technics of Optics before Coating

作　　者：胡江川[1] 刘夏来[1] 邱服民[1] 郭波[1] 鄢定尧[1] 杨李茗[1] 

机构地区：[1]成都精密光学工程研究中心,四川成都610041

出　　处：《激光与光电子学进展》2010年第3期114-119,共6页Laser & Optoelectronics Progress

摘　　要：研究了光学元件镀膜前超高洁净度要求的超声清洗工艺,在超声波清洗机的频率和功率一定的情况下,通过研究超声清洗剂、清洗温度、清洗时间等对光学元件超声清洗效果的影响,研制出有效清洗光学元件的清洗工艺,并保障超声清洗工艺对光学元件的表面状况无损伤。同时发现光学元件的放置时间会影响元件的清洗效果。超声清洗刚加工好的光学元件洁净效果较好,清洗时间较短;有6个月存放期的光学元件,表面颗粒污染很难洁净清洗。The ultrasonic cleaning technology of uncoated optics with high cleanliness requirement is studied. The effects of ultrasonic cleaner, cleaning temperature, cleaning time and other parameters on optics have been carried out. An effective ultrasonic cleaning technology without damage to the surface of optics is achieved. It is found that the standing time of the optics will affect the cleanliness; the freshly polished optics has better cleanliness and shorter cleaning time.

关 键 词：光学元件 超声清洗 清洗效果 放置时间 

分 类 号：O485[理学—固体物理]