饱和蒸发和热毛细力作用下低雷诺数液膜在波纹竖壁上的流动  

Flow of liquid film at low reynolds number down a vertical wavy plate with influences of saturated evaporation and thermo-capillary

作　　者：师晋生[1] 张巧珍[1] 

机构地区：[1]天津科技大学,天津300222

出　　处：《应用力学学报》2010年第1期166-172,共7页Chinese Journal of Applied Mechanics

基　　金：天津市应用基础研究计划面上项目(No.07JCYBJC01300)

摘　　要：考虑表面蒸发压力和热毛细力作用情况下,对饱和蒸发状态下低雷诺数自由降落液膜在小波幅正弦型波纹壁面上的流动进行理论分析。对控制微分方程及边界条件进行量纲一化并引入流函数,对微分方程及边界条件进行摄动展开,得到了这种情况下液膜流动的简化分析模型,求出了近似解析解。讨论了壁面波纹、表面张力、蒸发压力、热毛细力对液膜流动的影响。研究表明:液膜的波动幅度随蒸发强度和热毛细力的增大而增大;液膜波动与壁面波纹的相位差随蒸发强度增大而增大,随热毛细力增大而减小。A theoretical investigation of liquid film at low Reynolds number freely falling down a small sinusoidal wavy wall under influences of saturated evaporation and thermo-capillary on the film free surface is carried out. An approximate analytic model is presented by applying the perturbation expansion to the governing equations of the flow in form of dimensionless stream function. With the solution obtained, effects of the amplitude and the number of the wave surface of plate wall, the film surface tension, the evaporative reactive pressure and the thermo-capillary force exerted on the free surface of the film are discussed. It is found that the amplitude of the free surface of the film increases with the increment of the evaporation and thermo-capillary numbers, while the phase shift between the film and the wall increases with the increment of the evaporation number but with the decrease of the thermo-capillary number.

关 键 词：液膜 流动 波纹壁面 蒸发压力 热毛细力 

分 类 号：TK124[动力工程及工程热物理—工程热物理]