表面等离子体透射增强提高光刻分辨率的模拟  

Simulation of Enhanced Lithography Resolution by the Effect of High Transmission Based on Surface Plasmon Polaritons

作　　者：朱明轩[1,2] 李海华[1,2] 王庆康[1,2] 

机构地区：[1]上海交通大学微纳科学技术研究院微米/纳米加工技术国家级重点实验室 [2]上海交通大学微纳科学技术研究院薄膜与微细技术教育部重点实验室,上海200240

出　　处：《微纳电子技术》2010年第4期253-256,共4页Micronanoelectronic Technology

基　　金：国家自然科学基金资助项目(60808014);上海市科委纳米专项资助项目(0852nm06600)

摘　　要：讨论了表面等离子体透射增强现象在提高分辨率上的应用,数值模拟结果显示采用这种方法光刻的分辨率可以达到32nm。首先用FDTD法模拟了一维周期光栅结构的电场场强的分布,光栅模版具有三角形的脊,整个模版覆盖了一层Ag,然后讨论了三角形底角角度变化对透射率和分辨率的影响。当角度在57°～64°之间变化时,得出三角形脊部有透射增强现象产生,最大透射振幅是入射光的4.2倍,分辨率为(30±5)nm。因为凹槽部分透射光强度很小,因此具有很好的分辨率。通过对比周期和非周期边界条件模拟,三角形脊的形状是产生透射增强现象的原因。A novel method based on surface plasmon polaritons（SPPs）to enhance the resolution of the photolithography was discussed.The numerical simulation result indicates that with this method can achieve the feature size of 32 nm.Firstly,the electromagnetic field of one-dimension periodical gratings with triangular ridges and planar grooves covered by a silver membrane was simulated by FDTD.And then the influence of the base-angle change of ridges on the transmission and resolution was discussed.When the base-angle varied from 57°to 64°,the enhanced transmission was found at the area under the ridges.The results show that the maximum transmission amplitude is 4.2 times that of the incident light and the resolution is（30±5）nm.The transmission from grooves of the mask is not strong,hence the resolution is excellent.The comparison between the non-periodical and periodical boundary conditions indicates that the enhanced transmission is the result of the ridges shape instead of the periodical conditions.

关 键 词：表面等离子体激元 纳米光刻 FDTD方法 光刻分辨率 光栅 

分 类 号：O439[机械工程—光学工程]