离子注入结合离子交换技术制备KTiOPO_4光波导特性研究  

Characterization of Optical Waveguide in KTiOPO_4 Formed by Combining Ion Implantation with Ion Exchange

作　　者：王晓梅[1] 卢霏[1] 明宪兵[1] 

机构地区：[1]山东大学信息科学与工程学院,济南250100

出　　处：《光子学报》2010年第4期653-657,共5页Acta Photonica Sinica

基　　金：高等学校博士学科点专项科研基金(20070422078)资助

摘　　要：用离子注入结合离子交换技术形成了KTiOPO4平面光波导,研究了离子注入对离子交换波导结构的影响.使用棱镜耦合法测量了波导特性,结果显示形成了表面折射率升高的多模波导,通过背散射技术研究了离子交换后的Rb离子分布.实验表明,注入离子导致样品晶格损伤,在2.8μm处对离子交换形成了阻挡层,阻止了交换向KTP晶体的更深处进行.KTP planar waveguide is formed by combining ion implantation with ion exchange. The influence of ion implantation on the ion exchange waveguide are studied. The characterization of the waveguide is studied by the prism-coupling method, and the results indicate that positive change in refractive index occurs in the waveguide region. The irradiation damage and the Rb distribution are analyzed by means of the Rutherford backscattering spectrometry technique, and the results show that the lattice damages formed by ion implantation act as a diffusion barrier at about 2.8 μm under the surface,which stop the Rb ion and K ion exchange in the deeper depth.

关 键 词：光波导 离子注入 离子交换 KTiOPO4晶体 

分 类 号：TN252[电子电信—物理电子学]