Reflection z-scan for measuring the nonlinear refractive index of porous silicon  

作　　者：向梅 贾振红 吕晓毅 

机构地区：[1]College of Chemistry and Chemical Engineering,Xinjiang University [2]College of Information Science and Engineering,Xinjiang University

出　　处：《Optoelectronics Letters》2010年第3期226-228,共3页光电子快报（英文版）

基　　金：supported by the National Natural Science Foundation of China (No. 60748001);the Program for New Century Excellent Talents in University of China (No. NCET-05-0897);the Scientific Research Project for Universities in Xinjiang (No. XJEDU2006I10)

摘　　要：An experimental investigation on the nonlinear refractive index of nanoporous silicon at wavelengths of 532 nm and 1064 nm is reported by the reflection z-scan(RZ-scan) method with picosecond pulses.The porous silicon(PS) does not need to be peeled from silicon substrate.The method uses a p-polarized beam with oblique incidence.The modification of the reflected beam intensity gives the information of the surface nonlinear refractive index.The index of porous silicon at 1064 nm is at the same order of magnitude as that obtained by the conventional transmission z-scan technique,and the measured absolute value of nonlinear refractive index n2 at 532 nm is two orders of magnitude higher than that at 1064 nm.An experimental investigation on the nonlinear refractive index of nanoporous silicon at wavelengths of 532 nm and 1064 nm is reported by the reflection z-scan（RZ-scan） method with picosecond pulses.The porous silicon（PS） does not need to be peeled from silicon substrate.The method uses a p-polarized beam with oblique incidence.The modification of the reflected beam intensity gives the information of the surface nonlinear refractive index.The index of porous silicon at 1064 nm is at the same order of magnitude as that obtained by the conventional transmission z-scan technique,and the measured absolute value of nonlinear refractive index n2 at 532 nm is two orders of magnitude higher than that at 1064 nm.

关 键 词：非线性折射率 纳米多孔硅 扫描测量 32纳米 扫描技术 数量级 光强度 RZ码 

分 类 号：O435.1[机械工程—光学工程]